UV-curable Resist Transfer for Chasing Layout
UV 固化阻蚀转印錾刻底稿
标签：UV 固化, 阻蚀转印, 底稿, 精细纹样, 批量
将设计图印于透明胶片，铜面滚涂或丝印 UV 固化感光阻蚀墨（膜厚 10–20 μm），覆片曝光 30–60 s，显影后线稿精确转印至铜面；錾刻沿墨线走刀不偏移，完成后用专用剥离剂去膜。该法取代手工描稿，线条复位误差<0.1 mm，特别适合连续批量纹样、细密锦地与多件同稿复制。
Print the design onto film, roll- or screen-coat the copper with UV-curable photo-resist (10–20 μm), expose 30–60 s under the film, and develop—the layout transfers exactly; chase along the ink lines with no drift, then strip with a dedicated remover. Replacing hand drawing, registration error stays under 0.1 mm—ideal for repeating patterns, dense grounds and multi-piece copies. ---