PVD Imitation Gold Coating
PVD 仿金镀层
标签：PVD, 仿金, ZrN, TiN, 耐磨镀层
真空阴极弧/磁控溅射沉积 ZrN 或 TiN 仿金膜（厚度 0.5–2 μm，Lab 色度约 77/8/45，接近 24K 色），耐磨与耐蚀远优于电镀仿金，无氰无铬排放。流程：抛光至 Ra≤0.05 μm→超声波除油→离子刻蚀 10 min→沉积 30–60 min（温度 200–450℃）。工件须导电且耐温；复杂内腔膜厚不均可达 ±20%。适合大型装置与经常触摸的构件。
Cathodic arc/magnetron sputtering deposits ZrN or TiN imitation-gold films (0.5–2 μm, Lab ≈ 77/8/45, close to 24K), far more wear- and corrosion-resistant than plated imitation gold, with no cyanide or chromium discharge. Workflow: polish to Ra≤0.05 μm → ultrasonic degrease → ion etch 10 min → deposit 30–60 min (200–450℃). Parts must be conductive and heat-tolerant; deep recesses vary ±20%. Fits large installations and frequently touched pieces. ---