Photoresist Etching Workflow
感光蚀刻（光刻）全流程
标签：教程,光刻胶,紫外曝光,显影,三氯化铁
将转印好的 brass 板打磨清洁，涂布液态光刻胶并烘干，紫外曝光后显影露出待蚀刻区，浸入三氯化铁溶液蚀刻，最后褪胶清洗。关键是曝光时间需按胶层厚度试验确定。
Clean and polish the brass plate, coat liquid photoresist and dry it, UV-expose through a transfer, develop to reveal etch areas, immerse in ferric chloride, then strip resist and rinse. Calibrate exposure time by testing against resist thickness. ---